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A Survey of Electron Impact Cross-Sections for Halogens and Halogen Compounds of Interest to Plasma ProcessingPublished electron impact cross section data on halogens Cl2, F2, and halogen containing compounds such as Cx Fy, HCl, Cx Cly Fz are reviewed and critically evaluated based on the information provided by various researchers. The present work reports data on electron impact excitation, ionization, dissociation, electron attachment, electron detachment, and photo detachment. Elastic scattering cross sections and data on bulk properties such as diffusion coefficients in various background gases are also evaluated. Since some of the cross sectional data is derived from indirect measurements such as drift velocity, care has been taken to reconcile the differences among the reported data with due attention to the measurement technique. In conclusion, the processes with no or very limited amount of data and questionable set of data are identified and recommendation for further research direction is made.
Document ID
20020061302
Document Type
Conference Paper
Authors
Sharma, S. P. (NASA Ames Research Center Moffett Field, CA United States)
Rao, M. V. V. S. (NASA Ames Research Center Moffett Field, CA United States)
Arnold, James O.
Date Acquired
August 20, 2013
Publication Date
January 1, 1998
Subject Category
Inorganic, Organic and Physical Chemistry
Meeting Information
Gaseous Electronics Conference(HI)
Funding Number(s)
PROJECT: RTOP 632-10-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.