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Fluoropolymer Films Deposited by RF Plasma Sputtering of Polytetrafluoroethylene Using Inert GasesThe FT-IR (Fourier Transform Infrared), UV (Ultraviolet) and XPS (X Ray Photoelectron Spectroscopy) spectra of fluoropolymer films (SPTFE) deposited by rf (radio frequency) plasma sputtering of polytetrafluoroethylene (PTFE), using Ne, Kr and Xe as sputtering gases, were obtained and compared with prior spectra for SPTFE formed using He and Ar. The F/C (fluorine / carbon) ratios for SPTFE films (1.44-1.55), obtained at a rf power of 10 W, were essentially the same for all five rare gases, there being no trend of decreasing fluorine content in the SPTFE product with increasing atomic weight of the sputtering gas - contrary to the momentum transfer notion advanced by M. E. Ryan, et al. Increasing rf power from 10 to 50 W resulted in successively lower F/C ratios for SPTFE (e.g., from 1.55 to 1.21 in the case of Xe plasma-sputtered PTFE), accompanied by sputtering of the glass reactor and deposition of fragments of sodium aluminum silicate occurring at 40 W and above. In order to achieve a "Teflon-like" SPTFE structure (i.e., products with as high a F/C ratio as possible) in a given plasma reactor, an optimum rf power must be found, which in the present case was approximately 10 W.
Document ID
20020068982
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Golub, Morton A.
(NASA Ames Research Center Moffett Field, CA United States)
Wydeven, Theodore
(Lockheed Martin Engineering and Sciences Co. Moffett Field, CA United States)
Kliss, Mark
Date Acquired
August 20, 2013
Publication Date
January 1, 1998
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: Fluorinated Surfaces, Coatings and Films Symposium
Location: Boston, MA
Country: United States
Start Date: August 23, 1998
End Date: August 28, 1998
Sponsors: American Chemical Society
Funding Number(s)
PROJECT: RTOP 199-04-12-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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