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Record 1 of 3864
Fluoropolymer Films Deposited by RF Plasma Sputtering of Polytetrafluoroethylene Using Inert Gases
Author and Affiliation:
Golub, Morton A.(NASA Ames Research Center, Moffett Field, CA United States)
Wydeven, Theodore(Lockheed Martin Engineering and Sciences Co., Moffett Field, CA United States)
Kliss, Mark [Technical Monitor]
Abstract: The FT-IR (Fourier Transform Infrared), UV (Ultraviolet) and XPS (X Ray Photoelectron Spectroscopy) spectra of fluoropolymer films (SPTFE) deposited by rf (radio frequency) plasma sputtering of polytetrafluoroethylene (PTFE), using Ne, Kr and Xe as sputtering gases, were obtained and compared with prior spectra for SPTFE formed using He and Ar. The F/C (fluorine / carbon) ratios for SPTFE films (1.44-1.55), obtained at a rf power of 10 W, were essentially the same for all five rare gases, there being no trend of decreasing fluorine content in the SPTFE product with increasing atomic weight of the sputtering gas - contrary to the momentum transfer notion advanced by M. E. Ryan, et al. Increasing rf power from 10 to 50 W resulted in successively lower F/C ratios for SPTFE (e.g., from 1.55 to 1.21 in the case of Xe plasma-sputtered PTFE), accompanied by sputtering of the glass reactor and deposition of fragments of sodium aluminum silicate occurring at 40 W and above. In order to achieve a "Teflon-like" SPTFE structure (i.e., products with as high a F/C ratio as possible) in a given plasma reactor, an optimum rf power must be found, which in the present case was approximately 10 W.
Publication Date: Jan 01, 1998
Document ID:
20020068982
(Acquired Sep 13, 2002)
Subject Category: NONMETALLIC MATERIALS
Document Type: Preprint
Meeting Information: Fluorinated Surfaces, Coatings and Films Symposium; 23-28 Aug. 1998; Boston, MA; United States
Meeting Sponsor: American Chemical Society; United States
Contract/Grant/Task Num: RTOP 199-04-12-01
Financial Sponsor: NASA Ames Research Center; Moffett Field, CA United States
Organization Source: NASA Ames Research Center; Moffett Field, CA United States
Description: 1p; In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: No Copyright
NASA Terms: POLYTETRAFLUOROETHYLENE; PLASMAS (PHYSICS); FLUOROPOLYMERS; SPUTTERING; RARE GASES; SODIUM SILICATES; ALUMINUM SILICATES; RADIO FREQUENCIES; OPTIMIZATION; FOURIER TRANSFORMATION; FLUORINE; CARBON; PHOTOELECTRON SPECTROSCOPY
Availability Source: Other Sources
Availability Notes: Abstract Only
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