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Effect of the Chemical State of the Surface on the Relaxation of the Surface Shell Atoms in SiC and GaN NanocrystalsThe effect of the chemical state of the surface of nanoparticles on the relaxation in the near-surface layer was examined using the concept of the apparent lattice parameter (alp) determined for different diffraction vectors Q. The apparent lattice parameter is a lattice parameter determined either from an individual Bragg reflection, or from a selected region of the diffraction pattern. At low diffraction vectors the Bragg peak positions are affected mainly by the structure of the near-surface layer, while at high Q-values only the interior of the nano-grain contributes to the diffraction pattern. Following the measurements on raw (as prepared) powders we investigated powders cleaned by annealing at 400C under vacuum, and the same powders wetted with water. Theoretical alp-Q plots showed that the structure of the surface layer depends on the sample treatment. Semi-quantitative analysis based on the comparison of the experimental and theoretical alp-Q plots was performed. Theoretical alp-Q relations were obtained from the diffraction patterns calculated for models of nanocrystals with a strained surface layer using the Debye functions.
Document ID
20030001710
Acquisition Source
Marshall Space Flight Center
Document Type
Conference Paper
Authors
Palosz, B.
(Warsaw Univ. Warsaw, Poland)
Grzanka, E.
(Warsaw Univ. Warsaw, Poland)
Stelmakh, S.
(Warsaw Univ. Warsaw, Poland)
Pielaszek, R.
(Warsaw Univ. Warsaw, Poland)
Bismayer, U.
(Hamburg Univ. Germany)
Weber, H. P.
(European Synchrotron Radiation Facility Grenoble, France)
Janik, J. F.
(University of Mining and Metallurgy Cracow Poland)
Palosz, W.
(NASA Marshall Space Flight Center Huntsville, AL United States)
Curreri, Peter A.
Date Acquired
August 21, 2013
Publication Date
January 1, 2002
Subject Category
Solid-State Physics
Meeting Information
Meeting: XIX Congress of International Union of Crystallography
Location: Geneve
Country: Switzerland
Start Date: August 6, 2002
End Date: August 15, 2002
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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