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Plasma Enhanced Growth of Carbon Nanotubes For Ultrasensitive BiosensorsThe multitude of considerations facing nanostructure growth and integration lends itself to combinatorial optimization approaches. Rapid optimization becomes even more important with wafer-scale growth and integration processes. Here we discuss methodology for developing plasma enhanced CVD growth techniques for achieving individual, vertically aligned carbon nanostructures that show excellent properties as ultrasensitive electrodes for nucleic acid detection. We utilize high throughput strategies for optimizing the upstream and downstream processing and integration of carbon nanotube electrodes as functional elements in various device types. An overview of ultrasensitive carbon nanotube based sensor arrays for electrochemical bio-sensing applications and the high throughput methodology utilized to combine novel electrode technology with conventional MEMS processing will be presented.
Document ID
20040081042
Acquisition Source
Ames Research Center
Document Type
Preprint (Draft being sent to journal)
Authors
Cassell, Alan M.
(California Univ. Santa Cruz, CA, United States)
Meyyappan, M.
(California Univ. Santa Cruz, CA, United States)
Date Acquired
August 21, 2013
Publication Date
January 1, 2004
Subject Category
Plasma Physics
Meeting Information
Meeting: Nanomix, Inc.
Location: Emeryville, CA
Country: United States
Start Date: May 13, 2004
Funding Number(s)
CONTRACT_GRANT: NAS2-03144
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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