Effect of a Silicone Contaminant Film on the Transmittance Properties of AR-coated Fused Silica

We present the results of a laboratory test to determine the effects of bulk deposited, DC-704 silicone contaminant film on the transmittance properties of an anti-reflective (AR) coated fused silica optical substrate. Testing and optical measurements were performed in vacuum in the Boeing Combined Effects Test Facility (CETF). The test and measurement procedures are described herein. Measurement results are presented showing the change in transmittance characteristics as a function of contaminant deposit thickness and vacuum ultra-violet (vuv) exposure levels. Measurement results show an initial degradation in the transmittance of the contaminated sample. This is followed by a partial recovery in sample transmittance as the sample is exposed to additional VUV radiation. Transmittance results also show a loss of transmission in the ultraviolet portion of the spectrum and an increase in transmission in the infrared portion of the spectrum. These transmittance results are characteristic of thin-film interference effects. Thin-film analyses indicate that some of the observed transmittance results can be successfully modeled, but only if the contaminant film is assumed to be SiO2 rather than DC-704 silicone. Post-test Scanning Electron Microscope (SEM) scans of the test sample indicate the formation of contaminant islands and the presence of a thin uniform coating of contaminant deposit on the sample