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Thin Film Electrodes with an Integral Current Collection Grid for Use with Solid ElectrolytesThin film, high performance electrodes which can operate in high temperature environments are necessary for many devices which use a solid electrolyte. Electrodes of rhodium-tungsten alloy have been deposited on solid electrolyte using photolytic chemical vapor deposition (PCVD). A technique for depositing electrodes and current collection grids simultaneously has been developed using the prenucleation characteristics of PCVD. This technique makes it possible to fabricate electrodes which allow vapor transport through the thin (<1 (micro)m) portions of the electrode while integral thick grid lines improve the electronic conductivity of the electrode, thus improving overall performance.
Document ID
20060037903
Acquisition Source
Jet Propulsion Laboratory
Document Type
Preprint (Draft being sent to journal)
External Source(s)
Authors
Ryan, M. A.
Kisor, A.
Williams, R. M.
Jeffries-Nakamura, B.
O'Connor, D.
Date Acquired
August 23, 2013
Publication Date
May 23, 1994
Distribution Limits
Public
Copyright
Other
Keywords
thin film electrodes solid electrolyte vapor deposition current collection grids
photolytic chemical vapor deposition conductivity rhodium tungsten

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