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Record Details

Record 37 of 41279
Thin Film Electrodes with an Integral Current Collection Grid for Use with Solid Electrolytes
External Online Source: hdl:2014/33097
Author and Affiliation:
Ryan, M. A.
Kisor, A.
Williams, R. M.
Jeffries-Nakamura, B.
O'Connor, D.
Abstract: Thin film, high performance electrodes which can operate in high temperature environments are necessary for many devices which use a solid electrolyte. Electrodes of rhodium-tungsten alloy have been deposited on solid electrolyte using photolytic chemical vapor deposition (PCVD). A technique for depositing electrodes and current collection grids simultaneously has been developed using the prenucleation characteristics of PCVD. This technique makes it possible to fabricate electrodes which allow vapor transport through the thin (<1 (micro)m) portions of the electrode while integral thick grid lines improve the electronic conductivity of the electrode, thus improving overall performance.
Publication Date: May 23, 1994
Document ID:
20060037903
(Acquired Sep 14, 2006)
Document Type: Preprint
Financial Sponsor: Jet Propulsion Lab., California Inst. of Tech.; Pasadena, CA, United States
Description: In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: Copyright
NASA Terms: COMPUTATIONAL GRIDS; DEPOSITION; ELECTRODES; FABRICATION; HIGH TEMPERATURE ENVIRONMENTS; PHOTOLYSIS; RHODIUM; SOLID ELECTROLYTES; THIN FILMS; TUNGSTEN; VAPOR DEPOSITION; VAPORS
Other Descriptors: THIN FILM ELECTRODES SOLID ELECTROLYTE VAPOR DEPOSITION CURRENT COLLECTION GRIDS; PHOTOLYTIC CHEMICAL VAPOR DEPOSITION CONDUCTIVITY RHODIUM TUNGSTEN
Availability Source: Other Sources
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