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Insitu Calibration of Quartz Crystal MicrobalancesComputer models that predict the rate at which molecular contamination will deposit on optical surfaces typically use outgassing source terms, measured with quartz crystal microbalances, as a basis for the prediction. The American Society of Testing and Materials, Standard Test Method for Contamination Outgassing Characteristics of Spacecraft Materials (Method E-1559), is probably the best know technique used by the aerospace community to measure the outgassing rates or source terms of materials. A simple method for the insitu calibration of quartz crystal microbalances, based on the heat of enthalphy of Adipic Acid, has been developed and demonstrated by the Marshall Space Flight Center, Environmental Effects Group. The calibration has been demonstrated over a sample temperature range of 25 to 66 degrees Celsius and deposition rates of 7 x 10 (exp -11) grams/cm(sup 2)-s and greater, for several measurement system configurations. This calibration technique is fully compatible with the American Society for Testing and Materials, Method E-1559, as well as other methodology. The calibration requires no modification of outgassing facilities employing an effusion cell and does not degrade the performance or function of typical vacuum systems.
Document ID
20060047453
Acquisition Source
Marshall Space Flight Center
Document Type
Conference Paper
Authors
Albyn, Keith
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Burns, Dewit
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 23, 2013
Publication Date
January 1, 2006
Subject Category
Solid-State Physics
Meeting Information
Meeting: Optical System Contamination: Effects, Measurements and Control IX, The International Society for Optical Engineering (SPIE)
Location: San Diego, CA
Country: United States
Start Date: August 13, 2006
End Date: August 17, 2006
Sponsors: International Society for Optical Engineering
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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