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Silicon Nanotips Antireflection Surface for Micro Sun SensorWe have developed a new technique to fabricate antireflection surface using silicon nano-tips for use on a micro sun sensor for Mars rovers. We have achieved randomly distributed nano-tips of radius spanning from 20 nm to 100 nm and aspect ratio of ~200 using a two-step dry etching process. The 30(deg) specular reflectance at the target wavelength of 1 (mu)m is only about 0.09 %, nearly three orders of magnitude lower than that of bare silicon, and the hemispherical reflectance is ~ 8%. By changing the density and aspect ratio of these nanotips, the change in reflectance is demonstrated. Using surfaces covered with these nano-tips, the critical problem of ghost images that are caused by multiple internal reflections in a micro sun sensor was solved.
Document ID
20070018089
Acquisition Source
Jet Propulsion Laboratory
Document Type
Preprint (Draft being sent to journal)
External Source(s)
Authors
Bae, Sam Y.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Lee, Choonsup
(California Inst. of Tech. Pasadena, CA, United States)
Mobasser, Sohrab
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Manohara, Harish
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Date Acquired
August 23, 2013
Publication Date
July 17, 2006
Subject Category
Space Sciences (General)
Meeting Information
Meeting: IEEE Nano Conference
Location: Cincinnati, OH
Country: United States
Start Date: July 17, 2006
End Date: July 20, 2006
Sponsors: Institute of Electrical and Electronics Engineers
Distribution Limits
Public
Copyright
Other
Keywords
antireflection
Micro Sun Sensor (MSS)
nanotechnolgoy
Mars
nano-tips

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