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180 Degree Hybrid (Rat-Race) Junction on CMOS Grade Silicon with a Polyimide Interface Layer180-degree hybrid junctions can be used to equally divide power between two output ports with either a 0 or 180-degree phase difference. Alternatively, they can be used to combine signals from two sources and output a sum and difference signal. The main limitation of implementing; these on CMOS grade silicon is the high loss associated with the substrate. In this paper, we present a low loss 180-degree hybrid junction on CMOS grade (15 omega-cm) silicon with a polyimide interface layer for the first time. The divider utilizes Finite Ground Coplanar (FGC) line technology, and operates at a center frequency of 15 GIIz.
Document ID
20120009035
Acquisition Source
Glenn Research Center
Document Type
Conference Paper
Authors
Ponchak, George E.
(NASA Glenn Research Center Cleveland, OH, United States)
Papapolymerou, John
(Georgia Inst. of Tech. Atlanta, GA, United States)
Date Acquired
August 25, 2013
Publication Date
April 9, 2003
Subject Category
Electronics And Electrical Engineering
Meeting Information
Meeting: IEEE 2003 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems
Location: Grainau
Country: Germany
Start Date: April 9, 2003
End Date: April 11, 2003
Sponsors: Institute of Electrical and Electronics Engineers
Distribution Limits
Public
Copyright
Other

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