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High Contrast Internal and External Coronagraph Masks Produced by Various TechniquesMasks for high contrast internal and external coronagraphic imaging require a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes.
Document ID
20150008035
Document Type
Conference Paper
External Source(s)
Authors
Balasubramanian, Kunjithapatha (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Wilson, Daniel (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
White, Victor (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Muller, Richard (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Dickie, Matthew (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Yee, Karl (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Ruiz, Ronald (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Shaklan, Stuart (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Cady, Eric (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Kern, Brian (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Belikov, Ruslan (NASA Ames Research Center Moffett Field, CA, United States)
Guyon, Olivier (Arizona Univ. Tucson, AZ, United States)
Kasdin, N. Jeremy (Princeton Univ. Princeton, NJ, United States)
Date Acquired
May 12, 2015
Publication Date
August 25, 2013
Subject Category
Astronomy
Instrumentation and Photography
Meeting Information
SPIE Optics and Photonics(San Diego, CA)
Distribution Limits
Public
Copyright
Other
Keywords
Phase Induced Amplitude Apodization Complex Mask Coronagraph
Exoplanet
Shaped pupil
PIAA
Vector Vortex Coronagraph
Modified Band Limited Coronagraph
occulter