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Method of Fabricating X-Ray Absorbers for Low-Energy X-Ray SpectroscopyA method of forming low-energy x-ray absorbers. Sensors may be formed on a semiconductor, e.g., silicon, wafer. A seed metal layer, e.g., gold, is deposited on the wafer and patterned into stem pads for electroplating. Stems, e.g., gold, are electroplated from the stem seed pads through a stem mask. An absorber layer, e.g., gold, is deposited on the wafer, preferably e-beam evaporated. After patterning the absorbers, absorber and stem mask material is removed, e.g., in a solvent bath and critical point drying.
Document ID
20180006271
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Stevenson, Thomas R.
Balvin, Manuel A.
Denis, Kevin L.
Sadleir, John E.
Nagler, Peter C.
Date Acquired
October 15, 2018
Publication Date
September 11, 2018
Subject Category
Optics
Report/Patent Number
Patent Application Number: US-Patent-Appl-SN-15/280,369
Patent Number: US-Patent-10,074,764
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-10,074,764
Patent Application
US-Patent-Appl-SN-15/280,369
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