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Characterization of Silicon Carbide Pressure Sensors at 800 °CWe have performed the initial characterization of single crystal 4H silicon carbide (4H-SiC) pressure sensors to determine the operational reliability over time at 800 °C. Important parameters such as the zero pressure offset, bridge resistance, and pressure sensitivity as they are affected by temperature were extracted. These parameters showed relative stability within the prescribed operational envelop of the sensor at 800 °C. Of significance is the increase in pressure sensitivity with increasing temperature beyond 400 °C, to the extent that the sensitivity at 800 °C was higher than the room temperature value. The implication of this result is that the sensor can be inserted further into the high temperature environment, thereby capturing the wider bandwidth of the pressure transients than currently possible.
Document ID
20190026979
Acquisition Source
Glenn Research Center
Document Type
Conference Paper
Authors
Okojie, Robert S.
(NASA Glenn Research Center Cleveland, OH, United States)
Lukco, Dorothy
(Vantage Partners, LLC Brook Park, OH, United States)
Chang, Carl W.
(Vantage Partners, LLC Brook Park, OH, United States)
Savrun, Ender
(Sienna Technologies, Inc. Woodinville, WA, United States)
Date Acquired
July 3, 2019
Publication Date
June 23, 2019
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
GRC-E-DAA-TN67030
Report Number: GRC-E-DAA-TN67030
Meeting Information
Meeting: International Conference on Solid State Sensors, Actuators and Microsystems: Transducers 2019
Location: Berlin
Country: Germany
Start Date: June 23, 2019
End Date: June 27, 2019
Sponsors: Institute of Electrical and Electronics Engineers
Funding Number(s)
CONTRACT_GRANT: NNC14VF75P
WBS: 109492.02.03.02.20.01
CONTRACT_GRANT: NNC12BA01B
Distribution Limits
Public
Copyright
Public Use Permitted.
Technical Review
NASA Technical Management
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