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Using the scanning electron microscope on the production line to assure quality semiconductorsThe use of the scanning electron microscope to detect metallization defects introduced during batch processing of semiconductor devices is discussed. A method of determining metallization integrity was developed which culminates in a procurement specification using the scanning microscope on the production line as a quality control tool. Batch process control of the metallization operation is monitored early in the manufacturing cycle.
Document ID
19720018153
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Adolphsen, J. W.
(NASA Goddard Space Flight Center Greenbelt, MD, United States)
Anstead, R. J.
(NASA Goddard Space Flight Center Greenbelt, MD, United States)
Date Acquired
August 6, 2013
Publication Date
January 1, 1972
Publication Information
Publication: Significant Accomplishments in Technol., GSFC, 1970
Subject Category
Machine Elements And Processes
Accession Number
72N25803
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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