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Thermal and bias cycling stabilizes planar silicon devicesTerminal burn-in or baking step time in the processing of planar silicon devices is extended to reduce their inversion tendencies. The collector-base junction of the device is also cyclically biased during the burn-in.
Document ID
19670000176
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Harris, R. E.
Meinhard, J. E.
Date Acquired
August 3, 2013
Publication Date
June 1, 1967
Subject Category
Electronic Components And Circuits
Report/Patent Number
ERC-48
Report Number: ERC-48
Accession Number
67B10176
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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