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Improvement of screening methods for silicon planar semiconductor devicesThe results of the program for the development of a more sensitive method for selecting silicon planar semiconductor devices for long life applications are reported. The manufacturing technologies (MOS and Bipolar) are discussed along with the screening procedures developed as a result of the tests and evaluations, and the effectiveness of the MOS and Bilayer screening procedures are evaluated.
Document ID
19730007789
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Berger, W. M. (Philco-Ford Corp. Palo Alto, CA, United States)
Date Acquired
September 2, 2013
Publication Date
September 1, 1972
Subject Category
Machine Elements And Processes
Report/Patent Number
NASA-CR-124036
Report Number: NASA-CR-124036
Accession Number
73N16516
Funding Number(s)
CONTRACT_GRANT: NAS12-2197
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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