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Power SiGe Heterojunction Bipolar Transistors (HBTs) Fabricated by Fully Self-Aligned Double Mesa TechnologyMultifinger SiGe HBTs have been fabricated using a novel fully self-aligned double-mesa technology. With the novel process technology, a common-emitter 2x2x30 sq micrometer device exhibits high maximum oscillating frequency (f(sub max)) and cut-off frequency (f(sub T)) of 78 and 37 GHz, respectively. In class-A operation, a multifinger device with l0x2x30 sq micrometer emitter is expected to provide an output power of 25.6 dBm with a gain of 10 dB and a maximum power added efficiency (PAE) of 30.33% at 8 GHz.
Document ID
20010061488
Acquisition Source
Jet Propulsion Laboratory
Document Type
Preprint (Draft being sent to journal)
Authors
Lu, Liang-Hung
(Michigan Univ. Ann Arbor, MI United States)
Mohammadi, Saeed
(Michigan Univ. Ann Arbor, MI United States)
Ma, Zhen-Qiang
(Michigan Univ. Ann Arbor, MI United States)
Ponchak, George E.
(NASA Glenn Research Center Cleveland, OH United States)
Alterovitz, Samuel A.
(NASA Glenn Research Center Cleveland, OH United States)
Strohm, Karl M.
(Daimler-Benz Aerospace A.G. Ulm, Germany)
Luy, Johann-Friedrich
(Daimler-Benz Aerospace A.G. Ulm, Germany)
Downey, Alan
Date Acquired
September 7, 2013
Publication Date
January 1, 2001
Subject Category
Electronics And Electrical Engineering
Meeting Information
Meeting: IEEE MTT-S International Microwave Symposium
Location: Phoenix, AZ
Country: United States
Start Date: May 20, 2001
End Date: May 25, 2001
Sponsors: Institute of Electrical and Electronics Engineers
Funding Number(s)
PROJECT: RTOP 755-08-0B
CONTRACT_GRANT: JPL-961358
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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