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Fabrication of Channels for Nanobiotechnological DevicesA method, now undergoing development, of forming nanochannels in planar substrates is intended to enable the fabrication of advanced fluidic devices that could be integrated with complementary metal oxide semiconductor (CMOS) electronic circuits. Such integral combinations of fluidic and electronic components ("laboratory-on-a-chip" devices) could be used, for example, to detect individual molecules of deoxyribonucleic acid (DNA) and proteins. The width of a channel in such a device would be chosen so that molecules of the species of interest would move along the channel in single file. In this method, the fabrication of channels includes the use of such CMOS-compatible processes as chemical-mechanical polishing and oxide deposition. The layout of the channels in the substrate plane is determined by a single photolithographic process, but it is not a nanoscale lithographic process, and this process is not relied upon to define the thickness and width of the channels. Stating it from a slightly different perspective, unlike in the prior fabrication of electronic and fluidic devices involving the use of lithography to define microscale features, this process does not include the use of lithography to define nanoscale features. It is this aspect of the method that enables simplification of the process and, hence, a decrease in cost.
Document ID
Acquisition Source
Jet Propulsion Laboratory
Document Type
Other - NASA Tech Brief
Lee, Choonsup
(California Inst. of Tech. Pasadena, CA, United States)
Yang, Eui-Hyeok
(California Inst. of Tech. Pasadena, CA, United States)
Date Acquired
August 25, 2013
Publication Date
February 1, 2004
Publication Information
Publication: NASA Tech Briefs, February 2004
Subject Category
Nonmetallic Materials
Report/Patent Number
Distribution Limits
Public Use Permitted.
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