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Aperture, A Large Telescope Using Magnetostriction For Post Deployment Corrections: Final Technical Report of NASA Innovative Advanced Concepts (NIAC) Phase IIn summary, astronomical as well as Earth observing applications of the future are counting on larger aperture telescopes than are currently available. Several groups have been working on the topic of enabling large (about 16-m diameter) UV-Vis telescopes for many years. The unique feature of our concept is that magnetic films are used rather than electrostatic films or piezo-electrostatic pads. Our magnetic film concept allows for contiguous correction along the surface, does not require a hard wire connection, and does not require continuous external application of the field. There are many unknowns related to the initial accuracy of the deployed figure prior to the magnetic write head corrections. The length scale over which the corrections need to be applied is also of concern. For, although approximately mm length scale corrections can be made with the MSM plus write head technology, the number of 1 mm² patches in a 16 m diameter mirror is too large to contemplate applying individual corrections to each individual patch. However, deployment strategies and the materials available continue to evolve, in particular shape memory composites (SMCs) [34] or alloys (SMAs) [41], such that at this time we see no show-stoppers for this concept. Furthermore, the ability to tune deformations down to much (factors of 10-100) smaller (m) scale opens the futuristic possibility of improving the figure well beyond Strehl values of 90%.
Document ID
20190000518
Acquisition Source
Headquarters
Document Type
Other
Authors
Ulmer, M. P.
(Northwestern University Evanston, IL, United States)
Coverstone, V. L.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Cao, J.
(Northwestern University Evanston, IL, United States)
Chung, Y.-W.
(Northwestern University Evanston, IL, United States)
Corbineau, M.-C.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Case, A.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Murchison, B.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Lorenz, C.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Luo, G.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Pekosh, J.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Sepulveda, J.
(Illinois Univ. at Urbana-Champaign Urbana, IL, United States)
Schneider, A.
(Northwestern University Evanston, IL, United States)
Yan, X.
(Northwestern University Evanston, IL, United States)
Ye, S.
(Northwestern University Evanston, IL, United States)
Date Acquired
February 9, 2019
Publication Date
March 4, 2016
Subject Category
Optics
Report/Patent Number
HQ-E-DAA-TN64582
Funding Number(s)
CONTRACT_GRANT: NNX15AL89G
Distribution Limits
Public
Copyright
Portions of document may include copyright protected material.
Keywords
APERTURE
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